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Dipole formation to modulate flatband voltage using ALD Al2O3 and La2O3 at the interface between HfO2 and Si or Ge substrates

Yuanju Zhang, Moonsuk Choi, Zeli Wang, Changhwan Choi

2022Applied Surface Science21 citationsDOI

Topics & Concepts

Annealing (glass)Materials scienceDipoleMetalDielectricThin filmSubstrate (aquarium)Layer (electronics)Atomic layer depositionOptoelectronicsNanotechnologyChemistryComposite materialMetallurgyGeologyOceanographyOrganic chemistrySemiconductor materials and devicesSemiconductor materials and interfacesIntegrated Circuits and Semiconductor Failure Analysis
Dipole formation to modulate flatband voltage using ALD Al2O3 and La2O3 at the interface between HfO2 and Si or Ge substrates | Litcius