Enhanced Photoresponse from Ag/Bi<sub>2</sub>Se<sub>3</sub> Heterostructure Thin Films under Thermal Annealing
Gouttam Mallick, Prabhukrupa Chinmay Kumar, Ramakanta Naik, Rajib Biswal
Abstract
Semiconducting transition metal chalcogenides (TMCs) have shown great potential for optoelectronics applications due to their strong light absorption in a broad spectral range. Increasing the photoresponse ability of thin films is very much essential for many applications. The current study reports the increase in photoresponsivity and detectivity of annealed Ag/Bi 2 Se 3 film by many folds from its as-deposited state. The thermally evaporated bilayer film of Ag/Bi 2 Se 3 was annealed at different temperatures and was characterized by X-ray diffraction (XRD) and Raman study for structural changes in the films. The increase in crystallinity affects the structural parameters. The observed phases were verified using the high-resolution transmission electron microscopy (HRTEM) and selected area electron diffraction (SAED) patterns. The bilayer heterostructure and the Ag diffusion were probed from the cross-sectional field emission scanning electron microscope (FESEM) image and were and the surface morphology through the FESEM study. The elemental presence was confirmed from the energy-dispersive X-ray spectroscopy (EDX) data, whereas a ultraviolet–visible (UV–vis) spectrophotometer was used for the optical measurements. The reduction in transmittance upon annealing influenced several other optical parameters, and there is a reduction in band gap from 1.5 to 1.17 eV upon annealing. The third-order nonlinearity and nonlinear refractive index increased 2-fold, with the enhancement of the linear refractive index upon annealing. The hydrophobicity tendency is enhanced upon annealing, as found from the contact angle measurement. The photoresponse efficiency increased from 9.94 × 10 –7 AW –1 (as-deposited) to 2.72 × 10 –1 AW –1, and detectivity increased from 1.48 × 10 7 Jones (as-deposited) to 6.68 × 10 9 Jones for the 250 °C annealing. Both the dark and light current increased from nA to mA upon annealing at 250 °C. These findings establish a framework for designing and optimizing analogous materials, advancing their utility in next-generation optoelectronic applications requiring high sensitivity and energy efficiency.