Investigation of abrasive-free slurry for polysilicon buffing chemical mechanical planarization
Sanghuck Jeon, Jiah Hong, Seok‐Jun Hong, Chaitanya Kanade, Kihong Park, Hyunho Seok, Hojoong Kim, Sunyoung Lee, Taesung Kim
Topics & Concepts
Chemical-mechanical planarizationMaterials scienceX-ray photoelectron spectroscopyZeta potentialSlurryPEG ratioSurface roughnessAttenuated total reflectionChemical engineeringPassivationEthylene glycolFourier transform infrared spectroscopyEtching (microfabrication)AdsorptionPolishingAbrasiveComposite materialSurface finishLayer (electronics)NanotechnologyNanoparticleOrganic chemistryChemistryEconomicsEngineeringFinanceAdvanced Surface Polishing TechniquesForce Microscopy Techniques and ApplicationsDiamond and Carbon-based Materials Research