Effects of deposition precursors of hydrogenated amorphous carbon films on the plasma etching resistance based on mass spectrometer measurements and machine learning analysis
Jumpei Kurokawa, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori
Topics & Concepts
RadicalPlasma-enhanced chemical vapor depositionChemistryQuadrupole mass analyzerEllipsometryAnalytical Chemistry (journal)Chemical vapor depositionAmorphous solidReactive-ion etchingMass spectrometryAmorphous carbonEtching (microfabrication)Thin filmMaterials scienceNanotechnologyOrganic chemistryChromatographyLayer (electronics)Diamond and Carbon-based Materials ResearchIon-surface interactions and analysisMass Spectrometry Techniques and Applications