Kinetic and gas-phase study of the chemical vapor deposition of silicon carbide from C2H3SiCl3/H2
Anthony Desenfant, Guillaume Laduye, Gérard L. Vignoles, G. Chollon
Topics & Concepts
Chemical vapor infiltrationChemical vapor depositionSilicon carbideSiliconChemical engineeringHydrogenDeposition (geology)Materials scienceAtmospheric temperature rangePorosityGas compositionPlasma-enhanced chemical vapor depositionChemistryAnalytical Chemistry (journal)NanotechnologyComposite materialThermodynamicsMetallurgyEnvironmental chemistryOrganic chemistryPhysicsEngineeringSedimentBiologyPaleontologyAdvanced ceramic materials synthesisCopper Interconnects and ReliabilitySemiconductor materials and devices