Preferential crystal orientation etching of GaN nanopillars in Cl2 plasma
L. Jaloustre, Valentin Ackermann, Saron Sales De Mello, S. Labau, Camille Petit‐Etienne, E. Pargon
Topics & Concepts
Etching (microfabrication)Materials sciencePlasma etchingOptoelectronicsIsotropic etchingNanopillarReactive-ion etchingDry etchingNanotechnologyNanostructureCrystallographyChemistryLayer (electronics)GaN-based semiconductor devices and materialsPlasma Diagnostics and ApplicationsZnO doping and properties