Link between plasma properties with morphological, structural and mechanical properties of thin Ti films deposited by high power impulse magnetron sputtering
Pavel Moskovkin, Christian Maszl, Roland Schierholz, W Breilmann, Jan C. Petersen, Andreas Pflug, Jérôme Müller, Mohsin Raza, Stéphanos Konstantinidis, Achim von Keudell, Stéphane Lucas
Topics & Concepts
High-power impulse magnetron sputteringMaterials scienceThin filmSputter depositionKinetic Monte CarloSputteringPlasmaSurface roughnessComposite materialEnergetic materialPower densityMonte Carlo methodNanotechnologyThermodynamicsPower (physics)StatisticsOrganic chemistryPhysicsMathematicsQuantum mechanicsChemistryExplosive materialMetal and Thin Film MechanicsDiamond and Carbon-based Materials ResearchIon-surface interactions and analysis