Controlling the plasmonic properties of titanium nitride thin films by radiofrequency substrate biasing in magnetron sputtering
Luca Mascaretti, Tapan Barman, Beatrice Roberta Bricchi, F. Münz, Andrea Li Bassi, Štěpán Kment, Alberto Naldoni
Topics & Concepts
Titanium nitrideMaterials scienceSputter depositionSputteringBiasingTinOptoelectronicsThin filmPlasmonSubstrate (aquarium)TitaniumElectrical resistivity and conductivityNitrideMetallurgyNanotechnologyLayer (electronics)Electrical engineeringVoltageOceanographyEngineeringGeologyGaN-based semiconductor devices and materialsPlasmonic and Surface Plasmon ResearchZnO doping and properties