Conversion pathways of primary defects by annealing in proton-irradiated <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"><mml:mi>n</mml:mi></mml:math>-type <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"><mml:mrow><mml:mn>4</mml:mn><mml:mi>H</mml:mi></mml:mrow></mml:math>-SiC

Abstract

The development of defect populations after proton irradiation of $n$-type $4H$-SiC and subsequent annealing experiments is studied by means of deep level transient (DLTS) and photoluminescence spectroscopy. A comprehensive model is suggested describing the evolution and interconversion of irradiation-induced point defects during annealing below $1000^{\ensuremath{\circ}}\mathrm{C}$. The model proposes the ${\mathrm{EH}}_{4}$ and ${\mathrm{EH}}_{5}$ traps frequently found by DLTS to originate from the ($+$/0) charge transition level belonging to different configurations of the carbon antisite-carbon vacancy (CAV) complex. Furthermore, we show that the transformation channel between the silicon vacancy (${\mathrm{V}}_{\mathrm{Si}}$) and CAV is effectively blocked under $n$-type conditions, but becomes available in samples where the Fermi level has moved towards the center of the band gap due to irradiation-induced donor compensation. The annealing of ${\mathrm{V}}_{\mathrm{Si}}$ and the carbon vacancy (${\mathrm{V}}_{\mathrm{C}}$) is shown to be dominated by recombination with residual self-interstitials at temperatures of up to $400^{\ensuremath{\circ}}\mathrm{C}$. Going to higher temperatures, a decay of the CAV pair density is reported which is closely correlated to a renewed increase of ${\mathrm{V}}_{\mathrm{C}}$ concentration. A conceivable explanation for this process is the dissociation of the CAV pair into separate carbon anitisites and ${\mathrm{V}}_{\mathrm{C}}$ defects. Lastly, the presented data supports the claim that the removal of free carriers in irradiated SiC is due to introduced compensating defects and not passivation of shallow nitrogen donors.

Topics & Concepts