Research on single-crystal diamond surface polishing process and material removal mechanism based on inductively coupled plasma etching reactions
Jiangjun Zhou, Jiahuan Wang, Xiaoqiang Chen, Xu Wang, Jinhu Wang, Zhuohao Dai, Julong Yuan
Topics & Concepts
PolishingMaterials scienceEtching (microfabrication)DiamondChemical-mechanical planarizationSurface roughnessReactive-ion etchingX-ray photoelectron spectroscopyInductively coupled plasmaRaman spectroscopyIsotropic etchingSynthetic diamondAnalytical Chemistry (journal)Surface finishOptoelectronicsPlasma etchingComposite materialElectropolishingAmorphous solidLayer (electronics)WaferPlasmaCrystal (programming language)SputteringDry etchingMicroelectromechanical systemsAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchNanofabrication and Lithography Techniques