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Chemomechanical magnetorheological finishing: Process mechanism, research trends, challenges and opportunities in surface finishing

Yogendra Kumar, Harpreet Singh

2021Journal of Micromanufacturing21 citationsDOI

Abstract

Chemomechanical magnetorheological finishing (CMMRF) has emerged as a nanofinishing method that combines the characteristics of chemical mechanical polishing (CMP) and magneto-rheological finishing (MRF). The CMMRF process was designed to take into account both the chemical and mechanical effects that occur during the finishing process. In the field of material processing science, this article delves into the fundamentals of the CMMRF method. The potential research patterns linked to CMMRF are assessed and their benefits are determined. Furthermore, the challenges of improving CMMRF process capabilities, as well as the wide futuristic opportunities of the research sector, are emphasised, along with meeting all industrial needs. The findings of this analysis paper will also aid researchers in the field of advanced finishing in identifying process realisation for better results.

Topics & Concepts

Magnetorheological fluidPolishingProcess (computing)Mechanical engineeringManufacturing engineeringRealisationField (mathematics)Surface finishingMechanism (biology)Chemical-mechanical planarizationComputer scienceMaterials scienceProcess engineeringEngineeringStructural engineeringPhysicsDamperQuantum mechanicsPure mathematicsMathematicsOperating systemAdvanced Surface Polishing TechniquesAdvanced machining processes and optimizationIntegrated Circuits and Semiconductor Failure Analysis
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