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Advances and challenges in chemical mechanical polishing of silicon carbide: materials, mechanisms, and future directions

Ailin Li, Jiakai Zhou, Xinhuan Niu, Ziliang Liu, Qing Ma, Shaobo Song, Mengqi Wang, Bin Hu

2025Journal of Materials Chemistry C15 citationsDOI

Abstract

Silicon carbide (SiC), a third-generation wide bandgap semiconductor material, demonstrates immense potential in high-temperature, high-frequency, and high-power electronic devices.

Topics & Concepts

Materials scienceSilicon carbideSiliconSemiconductorNanotechnologyEngineering physicsSemiconductor materialsPolishingBand gapCarbideWide-bandgap semiconductorChemical-mechanical planarizationOptoelectronicsMetallurgySemiconductor deviceAdvanced Surface Polishing TechniquesAdvanced ceramic materials synthesisDiamond and Carbon-based Materials Research
Advances and challenges in chemical mechanical polishing of silicon carbide: materials, mechanisms, and future directions | Litcius