Study on effect of process and structure parameters on SiNxHy growth by in-line PECVD
Yujin Cao, Jicheng Zhou, Yaqing Ren, Wei Xu, Wenfeng Liu, Xianwu Cai, Baoxing Zhao
Topics & Concepts
Plasma-enhanced chemical vapor depositionMaterials scienceSilicon nitrideVolumetric flow rateTube (container)MicrowaveAnalytical Chemistry (journal)Thin filmSiliconComposite materialNanotechnologyOptoelectronicsMechanicsChemistryPhysicsTelecommunicationsComputer scienceChromatographyAdvancements in Semiconductor Devices and Circuit DesignSemiconductor materials and devicesThin-Film Transistor Technologies