Nanoporous Metal–Organic Framework Thin Films Prepared Directly from Gaseous Precursors by Atomic and Molecular Layer Deposition: Implications for Microelectronics
Jenna Multia, Dmitry E. Kravchenko, Víctor Rubio‐Giménez, Anish Philip, Rob Ameloot, Maarit Karppinen
Abstract
Atomic/molecular layer deposition (ALD/MLD) allows for the direct gas-phase synthesis of crystalline metal-organic framework (MOF) thin films. Here, we show for the first time using krypton and methanol physisorption measurements that ALD/MLD-fabricated copper 1,4-benzenedicarboxylate (Cu-BDC) ultrathin films possess accessible porosity matching that of the corresponding bulk MOF.
Topics & Concepts
Atomic layer depositionNanoporousMicroelectronicsPhysisorptionThin filmMaterials scienceLayer (electronics)Deposition (geology)Metal-organic frameworkPorosityMetalChemical engineeringNanotechnologyAdsorptionChemistryOrganic chemistryMetallurgyComposite materialSedimentPaleontologyBiologyEngineeringMetal-Organic Frameworks: Synthesis and ApplicationsCatalytic Processes in Materials ScienceSemiconductor materials and devices