Global optimization of process parameters for low-temperature SiNx based on orthogonal experiments
Lianqiao Yang, Chi Zhang, Wenlei Li, Guo-He Liu, Majiaqi Wu, Jinqiang Liu, Jianhua Zhang
Topics & Concepts
Materials sciencePlasma-enhanced chemical vapor depositionTaguchi methodsResidual stressDeposition (geology)Volumetric flow rateProcess optimizationSilicon nitrideChemical vapor depositionComposite materialElectronic engineeringOptoelectronicsLayer (electronics)EngineeringMechanicsPhysicsSedimentPaleontologyBiologyEnvironmental engineeringGaN-based semiconductor devices and materialsAdvanced ceramic materials synthesisThin-Film Transistor Technologies