Study of deposition parameters of reactive-sputtered Si3N4 thin films by optical emission spectroscopy
Raymundo Rodríguez-López, Genaro Soto-Valle, R. Sanginés, N. Abundiz-Cisneros, J. Águila-Muñoz, J. Cruz, R. Machorro-Mejía
Topics & Concepts
Silicon nitrideDeposition (geology)Thin filmMaterials scienceSputter depositionEllipsometryCharacterization (materials science)SiliconAnalytical Chemistry (journal)Light emissionNitrideEmission spectrumSpectroscopySputteringPlasmaOptoelectronicsChemistryNanotechnologySpectral lineLayer (electronics)PhysicsQuantum mechanicsPaleontologySedimentChromatographyAstronomyBiologySemiconductor materials and devicesMetal and Thin Film MechanicsZnO doping and properties