CMOS-compatible photonic integrated circuits on thin-film ScAlN
Sihao Wang, Veerendra Dhyani, S. Mohanraj, Xiaodong Shi, Binni Varghese, Wing Wai Chung, Ding Huang, Zhi Shiuh Lim, Qibin Zeng, Huajun Liu, Xianshu Luo, Victor Leong, Nanxi Li, Di Zhu
Abstract
Scandium aluminum nitride (ScAlN) has recently emerged as an attractive material for integrated photonics due to its favorable nonlinear optical properties and compatibility with complementary metal–oxide semiconductor (CMOS) fabrication. Despite the promising and versatile material properties, it is still an outstanding challenge to realize low-loss photonic circuits on thin-film ScAlN-on-insulator wafers. Here, we present a systematic study on the material quality of sputtered thin-film Sc0.1Al0.9N produced in a CMOS-compatible 200 mm line, including its crystallinity, roughness, and second-order optical nonlinearity, and developed an optimized fabrication process to yield 400 nm thick, fully etched waveguides. With surface polishing and annealing, we achieve micro-ring resonators with an intrinsic quality factor as high as 1.47 × 105, corresponding to a propagation loss of 2.4 dB/cm. These results serve as a critical step toward developing future large-scale, low-loss photonic integrated circuits based on ScAlN.