Tungsten passivation layer (WO3) formation mechanisms during chemical mechanical planarization in the presence of oxidizers
Maneesh Kumar Poddar, Palwasha Jalalzai, Samrina Sahir, Nagendra Prasad Yerriboina, Tae‐Gon Kim, Jin-Goo Park
Topics & Concepts
Chemical-mechanical planarizationPassivationTungstenDissolutionX-ray photoelectron spectroscopyRadicalChemistryLayer (electronics)PolishingCorrosionTungsten carbideOxideMaterials scienceInorganic chemistryChemical engineeringMetallurgyNanotechnologyPhysical chemistryOrganic chemistryEngineeringAdvanced Surface Polishing TechniquesSemiconductor materials and devicesDiamond and Carbon-based Materials Research