Strain engineering in single-, bi- and tri-layer MoS2, MoSe2, WS2 and WSe2
Félix Carrascoso, Hao Li, Riccardo Frisenda, Andrés Castellanos-Gómez
Abstract
Strain is a powerful tool to modify the optical properties of semiconducting transition metal dichalcogenides like MoS2, MoSe2, WS2 and WSe2. In this work we provide a thorough description of the technical details to perform uniaxial strain measurements on these two-dimensional semiconductors and we provide a straightforward calibration method to determine the amount of applied strain with high accuracy. We then employ reflectance spectroscopy to analyze the strain tunability of the electronic properties of single-, bi- and tri-layer MoS2, MoSe2, WS2 and WSe2. Finally, we quantify the flake-to-flake variability by analyzing 15 different single-layer MoS2 flakes.
Topics & Concepts
Strain (injury)Materials scienceLayer (electronics)SemiconductorTransition metalReflectivityOptoelectronicsNanotechnologyOpticsChemistryPhysicsCatalysisInternal medicineMedicineBiochemistry2D Materials and ApplicationsGraphene research and applicationsMXene and MAX Phase Materials