Modeling of material removal rate considering the chemical mechanical effects of lubricant, oxidant, and abrasive particles for aluminum chemical mechanical polishing at low pressure
Guang Xia, Zirui Wang, Qingyu Yao, Ping Sun, Huaijun Guan, Yongguang Wang, Cheng Fan, Da Bian, Dong Zhao, Yongwu Zhao, Yongwu Zhao
Topics & Concepts
LubricantChemical-mechanical planarizationAbrasiveMaterials sciencePolishingLubricationAluminiumTribologyScratchComposite materialDiffusionMetallurgyThermodynamicsPhysicsAdvanced Surface Polishing TechniquesAdvanced machining processes and optimizationForce Microscopy Techniques and Applications