Assessing advanced methods in XPS and HAXPES for determining the thicknesses of high-k oxide materials: From ultra-thin layers to deeply buried interfaces
T.R. Bure, O. Renault, Emmanuel Nolot, T. Lardin, C. Robert‐Goumet, Nicolas Pauly
Topics & Concepts
X-ray photoelectron spectroscopyMaterials scienceAnalytical Chemistry (journal)Atomic layer depositionHafniaThin filmOxideInelastic mean free pathLayer (electronics)OpticsNanotechnologyChemistryComposite materialChemical engineeringInelastic scatteringCeramicScatteringMetallurgyEngineeringChromatographyCubic zirconiaPhysicsSemiconductor materials and devicesElectron and X-Ray Spectroscopy TechniquesIon-surface interactions and analysis