Inherent selective pulsed chemical vapor deposition of amorphous hafnium oxide / titanium oxide nanolaminates
Yunil Cho, James Huang, Christopher F. Ahles, Zichen Zhang, Keith T. Wong, Srinivas Nemani, Ellie Yieh, Andrew C. Kummel
Topics & Concepts
Materials scienceAmorphous solidChemical vapor depositionOxideChemical engineeringAtomic layer depositionThin filmCrystallizationInorganic chemistryNanotechnologyMetallurgyOrganic chemistryChemistryEngineeringSemiconductor materials and devicesMetal and Thin Film MechanicsElectronic and Structural Properties of Oxides