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The Influence of Precursor Temperature on The Properties of Erbium-Doped Zirconium Telluride Thin Film Material Via Electrochemical Deposition

Ikhioya Lucky, Ezeorba M. Chigozirim, Okoroh Doris O, Anene C. Rita, Obasi C. Ogonnaya

2020International Journal of Applied Physics17 citationsDOI

Topics & Concepts

Materials scienceZirconiumThin filmTellurideElectrochemistryDeposition (geology)ErbiumDopingChemical engineeringNanotechnologyOptoelectronicsMetallurgyChemistryPhysical chemistryGeologyPaleontologySedimentElectrodeEngineeringChalcogenide Semiconductor Thin FilmsAdvanced Semiconductor Detectors and Materials2D Materials and Applications
The Influence of Precursor Temperature on The Properties of Erbium-Doped Zirconium Telluride Thin Film Material Via Electrochemical Deposition | Litcius