Effect of the gas flow rate in the focused-oxygen plasma treatment of solution-processed indium oxide thin film transistors
Xiaolin Wang, Han-Lin Zhao, Gergely Tarsoly, Hang Zhu, Jae‐Yun Lee, Sung‐Jin Kim
Topics & Concepts
Thin-film transistorIndiumMaterials scienceTransistorVolumetric flow rateThreshold voltageOxideOptoelectronicsThin filmPlasmaOxygenElectron mobilityNanotechnologyAnalytical Chemistry (journal)Layer (electronics)VoltageChemistryElectrical engineeringMetallurgyChromatographyEngineeringQuantum mechanicsOrganic chemistryPhysicsThin-Film Transistor TechnologiesZnO doping and propertiesTransition Metal Oxide Nanomaterials