Green Lithography for Delicate Materials
Artem K. Grebenko, Anton V. Bubis, K. A. Motovilov, Viacheslav Dremov, Е. В. Коростылев, Ivan Kindiak, Fedor S. Fedorov, Sergey Yu. Luchkin, Yuliya Zhuikova, A. M. Trofimenko, Gleb I. Filkov, Georgiy Sviridov, А. А. Иванов, Jordan T. Dull, Rais N. Mozhchil, А. М. Ионов, В. П. Варламов, Barry P. Rand, Vitaly Podzorov, Albert G. Nasibulin
Abstract
Abstract A variety of unconventional materials, including biological nanostructures, organic and hybrid semiconductors, as well as monolayer, and other low‐dimensional systems, are actively explored. They are usually incompatible with standard lithographic techniques that use harsh organic solvents and other detrimental processing. Here, a new class of green and gentle lithographic resists, compatible with delicate materials and capable of both top‐down and bottom‐up fabrication routines is developed. To demonstrate the excellence of this approach, devices with sub‐micron features are fabricated on organic semiconductor crystals and individual animal's brain microtubules. Such structures are created for the first time, thanks to the genuinely water‐based lithography, which opens an avenue for the thorough research of unconventional delicate materials at the nanoscale.