Litcius/Paper detail

Materials to Systems Co-Optimization Platform for Rapid Technology Development Targeting Future Generation CMOS Nodes

El Mehdi Bazizi, Ashish Pal, Jongchol Kim, Jiang Liu, V H Prasad Reddy, Blessy Alexander, Buvna Ayyagari-Sangamalli

2021IEEE Transactions on Electron Devices32 citationsDOI

Abstract

Design technology co-optimization (DTCO) has been a workhorse in optimizing logic technology innovations for a few generations now. With increased complexity associated with each new node and the growing number of technological innovations, it is time to expand the conventional DTCO flows. In this article, we present a novel materials to systems co-optimization (MSCO) platform, expanding the boundaries of traditional DTCO to encompass materials modeling to all the way to system design. To demonstrate the application of our MSCO platform, we discuss various front-end-of-line (FEOL) and middle-of-line (MOL)/back-end-of-line (BEOL) technologies and show their impact on device and circuit performance.

Topics & Concepts

CMOSNode (physics)Front and back endsTechnology developmentComputer scienceEngineeringLine (geometry)Back end of lineComputer architectureElectronic engineeringElectrical engineeringManufacturing engineeringMechanical engineeringStructural engineeringDielectricGeometryMathematicsSemiconductor materials and devicesAdvancements in Semiconductor Devices and Circuit DesignIntegrated Circuits and Semiconductor Failure Analysis
Materials to Systems Co-Optimization Platform for Rapid Technology Development Targeting Future Generation CMOS Nodes | Litcius