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Stability of the threshold voltage in fluorine-implanted normally-off AlN/GaN HEMTs co-integrated with commercial normally-on GaN HEMT technology

Florent Albany, F. Lecourt, Ewa Walasiak, Nicolas Defrance, Arnaud Curutchet, Hassan Maher, Y. Cordier, Nathalie Labat, Nathalie Malbert

2021Microelectronics Reliability10 citationsDOIOpen Access PDF

Topics & Concepts

Threshold voltageTransconductanceHigh-electron-mobility transistorMaterials scienceIonFluorineOptoelectronicsStress (linguistics)Degradation (telecommunications)Ion implantationWide-bandgap semiconductorTransistorVoltageAnalytical Chemistry (journal)ChemistryElectrical engineeringMetallurgyOrganic chemistryPhilosophyLinguisticsChromatographyEngineeringGaN-based semiconductor devices and materialsZnO doping and propertiesMetal and Thin Film Mechanics
Stability of the threshold voltage in fluorine-implanted normally-off AlN/GaN HEMTs co-integrated with commercial normally-on GaN HEMT technology | Litcius