Genetic algorithm-based optical proximity correction for DMD maskless lithography
Zhuojun Yang, Jie Lin, Liwen Liu, Zhu Zicheng, Rui Zhang, Shaofeng Wen, Yifeng Yin, Changyong Lan, Chun Li, Yong Liu
Abstract
We present an optical proximity correction (OPC) method based on a genetic algorithm for reducing the optical proximity effect-induced pattern distortion in digital micromirror device (DMD) maskless lithography. Via this algorithm-assisted grayscale modulation of the initial mask at the pixel level, the exposure pattern can be enhanced significantly. Actual exposure experiments revealed that the rate of matching between the final exposure pattern and the mask pattern can be increased by up to 20%. This method's applicability to complex masks further demonstrates its universality for mask pattern optimization. We believe that our algorithm-assisted OPC could be highly helpful for high-fidelity and efficient DMD maskless lithography for microfabrication.