Uniform and robust TiN/HfO2/Pt memristor through interfacial Al-doping engineering
Yunlai Zhu, Kan‐Hao Xue, Xiaomin Cheng, Chong Qiao, Jun‐Hui Yuan, Li-Heng Li, Xiangshui Miao
Topics & Concepts
TinMemristorDopingMaterials scienceOptoelectronicsNanotechnologyElectronic engineeringMetallurgyEngineeringAdvanced Memory and Neural ComputingFerroelectric and Negative Capacitance DevicesMXene and MAX Phase Materials