Novel hexameric tin carboxylate clusters as efficient negative-tone EUV photoresists: high resolution with well-defined patterns under low energy doses
Jia‐Rong Wu, Ting‐An Lin, Yanru Wu, Po-Hsiung Chen, Tsi-Sheng Gau, Burn-Jeng Lin, Po‐Wen Chiu, Rai‐Shung Liu
Abstract
-butyl groups of cluster 1 are prone to cleavage whereas the vinyl-Sn bonds of species 2 are inert toward EUV irradiation; participation of radical polymerization is evident for the latter.
Topics & Concepts
Extreme ultraviolet lithographyTinTone (literature)CarboxylateResistEnergy (signal processing)Extreme ultravioletResolution (logic)Materials scienceChemistryNanotechnologyOptoelectronicsPhysicsOpticsComputer scienceStereochemistryLaserOrganic chemistryQuantum mechanicsArtificial intelligenceLayer (electronics)LiteratureArtAdvancements in Photolithography TechniquesIntegrated Circuits and Semiconductor Failure AnalysisElectron and X-Ray Spectroscopy Techniques