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Improved Channel Electron Mobility Through Electric Field Reduction in GaN Quantum-Well Double-Heterostructures

Junya Yaita, Koichi Fukuda, Atsushi Yamada, Takuya Iwasaki, Shu Nakaharai, Junji Kotani

2021IEEE Electron Device Letters14 citationsDOI

Abstract

To improve the electron mobility of quantum well (QW) gallium nitride (GaN) high electron mobility transistors (HEMT), we investigated QW and conventional AlGaN/GaN heterostructures grown by metal organic vapor phase epitaxy. Using calculation and experimental results, we revealed that the primary reason for the reduced electron mobility of the QW GaN-HEMT is the increase in intrasubband scattering events because of excessive electron confinement, which is caused by a strong polarization electric field. A strained Al <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.30</sub> Ga <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.70</sub> N/Al <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.86</sub> Ga <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.14</sub> N buffer structure was applied to alleviate the electric field in the GaN channel while maintaining a strong electron confinement. It enables to increase the piezo polarization of Al <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.30</sub> Ga <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.70</sub> N and thus, reduces that of the GaN channel. Consequently, the electron mobility improved to 1420 cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> /Vs for the QW GaN-HEMT structure with the Al <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.30</sub> Ga <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.70</sub> N/Al <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.86</sub> Ga <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.14</sub> N buffer from 1100 cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> /Vs for the common QW GaN-HEMT structure. To the best of our knowledge, 1420 cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> /Vs at a two-dimensional electron gas density of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$1.5\times 10^{{13}}$ </tex-math></inline-formula> cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">−2</sup> is the highest electron mobility in the QW double heterostructure.

Topics & Concepts

High-electron-mobility transistorElectric fieldHeterojunctionElectron mobilityGallium nitrideElectronMaterials sciencePhysicsOptoelectronicsTopology (electrical circuits)TransistorElectrical engineeringNanotechnologyQuantum mechanicsVoltageEngineeringLayer (electronics)GaN-based semiconductor devices and materialsGa2O3 and related materialsSemiconductor Quantum Structures and Devices
Improved Channel Electron Mobility Through Electric Field Reduction in GaN Quantum-Well Double-Heterostructures | Litcius