Litcius/Paper detail

Marker-free stitching deflectometry for three-dimensional measurement of the specular surface

Ruiyang Wang, Dahai Li, Xinwei Zhang, Wanxing Zheng, Linzhi Yu, Renhao Ge

2021Optics Express24 citationsDOIOpen Access PDF

Abstract

Due to the ‘invisible’ property of the specular surface, it is difficult for the stitching deflectometry to identify the overlapping area. Previously, markers were used on the unit under test with a roughly known shape to find the overlapping area. We propose a marker-free stitching deflectometry that utilizes the stereo-iterative algorithm to calculate the sub-aperture point cloud without height-slope ambiguity, and the overlapping area is identified with the point cloud datum. The measured area is significantly enlarged. The simulation and experiments are conducted to verify the proposal and evaluate the accuracy. We test a high-quality flat with 190mm diameter, the measurement error is below 100nm RMS with comparison to the interferometer.

Topics & Concepts

Image stitchingOpticsSpecular reflectionPoint cloudGeodetic datumComputer sciencePoint (geometry)Computer visionArtificial intelligencePhysicsGeologyGeometryGeodesyMathematicsOptical measurement and interference techniquesAdvanced Measurement and Metrology TechniquesSurface Roughness and Optical Measurements