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Chemical Vapor Deposition Growth of MoS<sub>2</sub> on g-C<sub>3</sub>N<sub>4</sub> Nanosheets for Efficient Removal of Tetracycline Hydrochloride

Chuanjie Wang, Wenbin Shi, Kaili Zhu, Xinxin Luan, Ping Yang

2022Langmuir18 citationsDOI

Abstract

, the sample MS-CN revealed fast and large adsorption capacity for tetracycline hydrochloride (TCH). The adsorption kinetics model proved that TCH could be rapidly adsorbed within 5 min, and chemical adsorption was dominant. For single-component adsorption of TCH, the maximum adsorption capacity was ∼154 mg/g. The monolayer adsorption was carried out on the surface of MS-CN. Both of the film and intra-particle diffusion were considered as significant processes to facilitate adsorption. Thermodynamic parameters indicate that the adsorption of TCH is a spontaneous endothermic process. The adsorption of TCH was highly pH-dependent. The maximum adsorption capacity of TCH was obtained in the case of pH ∼ 7. After four adsorption and desorption cycles, MS-CN still maintained well-adsorption performance. Multiple adsorption mechanism, pore filling, electrostatic force, π-π conjugation, and hydrogen bonding interactions were studied. Because of fast adsorption, large adsorption capacity, and high stability, it is a promising adsorbent for antibiotics.

Topics & Concepts

AdsorptionChemistryDesorptionEndothermic processMonolayerDiffusionChemical engineeringChemical vapor depositionTetracycline HydrochlorideTetracyclineOrganic chemistryThermodynamicsPhysicsBiochemistryAntibioticsEngineeringAdvanced Photocatalysis Techniques2D Materials and ApplicationsMXene and MAX Phase Materials
Chemical Vapor Deposition Growth of MoS<sub>2</sub> on g-C<sub>3</sub>N<sub>4</sub> Nanosheets for Efficient Removal of Tetracycline Hydrochloride | Litcius