HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
Chaoyi Yin, Meiping Zhu, Tingting Zeng, Chen Song, Yingjie Chai, Yuchuan Shao, Rongjun Zhang, Jiaoling Zhao, Dawei Li, Jianda Shao
Topics & Concepts
Atomic layer depositionMaterials scienceLaserPlasmaDeposition (geology)UltravioletLayer (electronics)Reflection (computer programming)OptoelectronicsThin filmAbsorption (acoustics)IrradiationOpticsNanotechnologyComposite materialPhysicsSedimentPaleontologyQuantum mechanicsNuclear physicsBiologyComputer scienceProgramming languageSemiconductor materials and devicesDiamond and Carbon-based Materials ResearchElectronic and Structural Properties of Oxides