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Design and Analysis of Triple Metal Vertical TFET Gate Stacked with N-Type SiGe Delta-Doped Layer

Shilpi Gupta, Subodh Wairya, Shailendra Singh

2021Silicon15 citationsDOI

Topics & Concepts

Materials scienceAmbipolar diffusionOptoelectronicsDopingQuantum tunnellingStackingWork functionMetal gateElectric fieldHeterojunctionNanotechnologyElectrical engineeringGate oxideLayer (electronics)TransistorVoltageElectronPhysicsEngineeringNuclear magnetic resonanceQuantum mechanicsAdvancements in Semiconductor Devices and Circuit DesignSemiconductor materials and devicesNanowire Synthesis and Applications
Design and Analysis of Triple Metal Vertical TFET Gate Stacked with N-Type SiGe Delta-Doped Layer | Litcius