Recent progress of inorganic photoresists for next-generation EUV lithography
Yeo Kyung Kang, Sun Jin Lee, Sunghun Eom, Byeong Geun Kim, Chan-Cuk Hwang, Myung‐Gil Kim
Abstract
The continuous scaling down of semiconductor devices has significantly benefited consumers by enhancing the device performance, portability, power efficiency, and affordability.
Topics & Concepts
Extreme ultraviolet lithographyMaterials scienceLithographyResistNanotechnologyNext-generation lithographyMultiple patterningEngineering physicsOptoelectronicsElectron-beam lithographyEngineeringLayer (electronics)Advancements in Photolithography TechniquesElectron and X-Ray Spectroscopy TechniquesIntegrated Circuits and Semiconductor Failure Analysis