Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
Raffaella Lo Nigro, Emanuela Schilirò, Giovanni Mannino, Salvatore Di Franco, Fabrizio Roccaforte
Topics & Concepts
Atomic layer depositionEllipsometryHafniumDielectricDeposition (geology)Thin filmAnalytical Chemistry (journal)Chemical vapor depositionLayer (electronics)OxygenChemistryPlasmaChemical engineeringOxideMaterials scienceInorganic chemistryNanotechnologyOptoelectronicsZirconiumEnvironmental chemistryOrganic chemistryPaleontologyPhysicsBiologySedimentQuantum mechanicsEngineeringSemiconductor materials and devicesElectronic and Structural Properties of OxidesFerroelectric and Negative Capacitance Devices