Multiscale simulation of extreme ultraviolet nanolithography: impact of acid–base reaction on pattern roughness
Hyungwoo Lee, Sungwoo Park, Muyoung Kim, Junghwan Moon, Byunghoon Lee, Maenghyo Cho
Abstract
Impact of acid–base neutralization in EUV lithography was investigated using our newly developed multi-scale framework (DFT-MD-FDM).
Topics & Concepts
Extreme ultraviolet lithographyNanolithographyMaterials scienceExtreme ultravioletLithographyUltravioletBase (topology)Surface finishSurface roughnessScale (ratio)NanotechnologyOptoelectronicsOpticsComposite materialPhysicsFabricationMathematical analysisMedicinePathologyLaserMathematicsQuantum mechanicsAlternative medicineAdvancements in Photolithography TechniquesNanofabrication and Lithography TechniquesIntegrated Circuits and Semiconductor Failure Analysis