Study on OH radical oxidation of 4H-SiC in plasma based on ReaxFF molecular dynamics simulation
Dongxiao Yan, Hui Huang, Yuxiang Huang, Hao Yang, Nian Duan
Topics & Concepts
ReaxFFRadicalChemistryDissociation (chemistry)Molecular dynamicsPhotochemistryAdsorptionMoleculeChemical engineeringPhysical chemistryComputational chemistryOrganic chemistryEngineeringInteratomic potentialDiamond and Carbon-based Materials ResearchPlasma Applications and DiagnosticsSemiconductor materials and devices