Low-resistivity ruthenium metal thin films grown via atomic layer deposition using dicarbonyl-bis(5-methyl-2,4-hexanediketonato)ruthenium(II) and oxygen
Eun Chong Ko, Jae Yeon Kim, Hakseung Rhee, Kyung Min Kim, Jeong Hwan Han
Topics & Concepts
Materials scienceImpurityRutheniumAtomic layer depositionCrystallinityElectrical resistivity and conductivityGrain sizeCrystalliteAnnealing (glass)OxygenThin filmAnalytical Chemistry (journal)MetalInorganic chemistryChemical engineeringMetallurgyNanotechnologyComposite materialChemistryCatalysisOrganic chemistryEngineeringElectrical engineeringSemiconductor materials and devicesCopper Interconnects and ReliabilitySemiconductor materials and interfaces