Optimization of mica surface hydroxylation in water vapor plasma monitored by optical emission spectroscopy
Patrick Rupper, Martin Amberg, Dirk Hegemann, Manfred Heuberger
Topics & Concepts
SilanolChemistryX-ray photoelectron spectroscopyDerivatizationMicaAnalytical Chemistry (journal)ReagentHydroxyl valueSpectroscopyChemical engineeringOrganic chemistryChromatographyMaterials scienceCatalysisPolyurethaneMass spectrometryEngineeringQuantum mechanicsPolyolPhysicsComposite materialDiamond and Carbon-based Materials ResearchMetal and Thin Film MechanicsForce Microscopy Techniques and Applications