ReaxFF molecular dynamics simulation of single-crystalline silicon plasma polishing and subsurface damage removal
Hao Sun, Yang Hu, Long Bai, Jianfeng Xu
Topics & Concepts
ReaxFFMonocrystalline siliconPolishingSiliconMaterials scienceEtching (microfabrication)Molecular dynamicsCrystalline siliconPlasma etchingAtom (system on chip)PlasmaAmorphous solidChemical physicsChemical engineeringNanotechnologyComposite materialCrystallographyChemistryMetallurgyLayer (electronics)Computational chemistryInteratomic potentialEngineeringPhysicsQuantum mechanicsEmbedded systemComputer scienceAdvanced Surface Polishing TechniquesSemiconductor materials and devicesDiamond and Carbon-based Materials Research