Area-selective atomic layer deposition of Ru thin films by chemo-selective inhibition of alkyl aldehyde molecules on nitride surfaces
Jinseon Lee, Jieun Oh, Jiwon Kim, Hongjun Oh, Bonggeun Shong, Woo‐Hee Kim, Woo‐Hee Kim
Topics & Concepts
Atomic layer depositionX-ray photoelectron spectroscopyTinMaterials scienceAlkylNitrideSurface modificationNanotechnologyThin filmTitanium nitrideTin oxideSubstrate (aquarium)Tantalum nitrideChemical engineeringLayer (electronics)ChemistryOxideOrganic chemistryOceanographyEngineeringMetallurgyGeologySemiconductor materials and devicesFerroelectric and Negative Capacitance DevicesAdvanced Memory and Neural Computing