Improvements in patterning quality and fidelity in plasmonic lithography incorporating optical proximity correction
Chin‐Kai Chang, Hsin-Yi Chien
Topics & Concepts
LithographyPlasmonPhotomaskMaterials sciencePhotoresistPhotolithographyComputational lithographyMaskless lithographyProcess windowMultiple patterningExtreme ultraviolet lithographyOpticsNext-generation lithographyOptoelectronicsOptical proximity correctionNanotechnologyResistElectron-beam lithographyPhysicsLayer (electronics)Advancements in Photolithography TechniquesOptical Coatings and GratingsPlasmonic and Surface Plasmon Research