Deep ensemble learning for material removal rate prediction in chemical mechanical planarization with pad surface topography
Jongmin Jeong, Yeongil Shin, Seunghun Jeong, Seonho Jeong, Haedo Jeong
Topics & Concepts
Chemical-mechanical planarizationSurface (topology)Materials scienceEnsemble learningComputer scienceArtificial intelligenceComposite materialPolishingGeometryMathematicsAdvanced Surface Polishing TechniquesSurface Roughness and Optical MeasurementsAdvanced machining processes and optimization