Optimization strategy for epoxy cross-linked molecular glass photoresist in EUV lithography
Jiaxing Gao, Siliang Zhang, Xuewen Cui, Xue Cong, Xudong Guo, Rui Hu, Shuangqing Wang, Jinping Chen, Yi Li, Peng Tian, Michaela Vockenhuber, Dimitrios Kazazis, Yasin Ekinci, Guoqiang Yang
Topics & Concepts
Extreme ultraviolet lithographyPhotoresistEpoxyMaterials scienceResistLithographyPhotolithographyCationic polymerizationPolymerizationNanotechnologyOptoelectronicsPolymerComposite materialPolymer chemistryLayer (electronics)Advancements in Photolithography TechniquesNanofabrication and Lithography TechniquesIntegrated Circuits and Semiconductor Failure Analysis