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Utilization of Nickel Ferrite (NiFe<sub>2</sub>O<sub>4</sub>) in Hematite (α‐Fe<sub>2</sub>O<sub>3</sub>) Photoanode for Photoelectrochemical Water Splitting as a Blocking Layer

Na Kyung Lee, Woon Yong Sohn

2023ChemPhotoChem10 citationsDOI

Abstract

Abstract We found a new blocking layer (nickel ferrite, NiFe 2 O 4 ), that could be utilized for the suppression of the back recombination, occurring in the hematite (α‐Fe 2 O 3 ) photoanode. The photoanode in which the NiFe 2 O 4 layer was introduced showed a cathodic shift of the onset potential in the current density versus applied voltage curve. We successfully demonstrated that the NiFe 2 O 4 layer effectively inhibited the back recombination in the hematite film through the use of electrochemical and time‐resolved spectroscopic methods.

Topics & Concepts

HematiteNickelMaterials scienceElectrochemistryLayer (electronics)Ferrite (magnet)Water splittingCathodic protectionPhotoelectrochemistryChemical engineeringMetallurgyNanotechnologyElectrodeChemistryComposite materialPhysical chemistryPhotocatalysisCatalysisEngineeringBiochemistryIron oxide chemistry and applicationsMine drainage and remediation techniquesArsenic contamination and mitigation
Utilization of Nickel Ferrite (NiFe<sub>2</sub>O<sub>4</sub>) in Hematite (α‐Fe<sub>2</sub>O<sub>3</sub>) Photoanode for Photoelectrochemical Water Splitting as a Blocking Layer | Litcius