Area selective deposition using alternate deposition and etch super-cycle strategies
M. Bonvalot, C. Vallée, C. Mannequin, Moustapha Jaffal, R. Gassilloud, N. Possémé, T. Chevolleau
Abstract
.). In this paper, we discuss how to optimize this step and we show that different approaches can be developed to optimize the overall ASD process throughput, while simultaneously limiting process drift and contamination. We also show that complementary selective properties can prove a valuable leverage enabling ASD processes based on super-cycles, such as structure selective deposition, whereby a difference in thin film morphology in growth and non-growth areas can be smartly taken advantage of during the etching step.
Topics & Concepts
Deposition (geology)Etching (microfabrication)Materials sciencePhotolithographyAtomic layer depositionSubstrate (aquarium)NanotechnologyOptoelectronicsComputer scienceLayer (electronics)GeologyOceanographySedimentPaleontologySemiconductor materials and devicesCopper Interconnects and ReliabilityPlasma Diagnostics and Applications