Litcius/Paper detail

The physical improvement of copper deposition uniformity with the simulation models

Chun-Wei Ma, Shun-Hsuan Yu, Jen-Kuang Fang, Ping‐Feng Yang, Hou-Chien Chang

2023Journal of Electroanalytical Chemistry12 citationsDOI

Topics & Concepts

WaferOverpotentialMultiphysicsCathodeAnodeElectroplatingDeposition (geology)Current (fluid)ChemistryCopperCurrent densityElectrolyteElectrodeFinite element methodLayer (electronics)Composite materialOptoelectronicsMaterials scienceThermodynamicsElectrochemistryPhysicsPhysical chemistryPaleontologyBiologySedimentQuantum mechanicsOrganic chemistryElectrodeposition and Electroless CoatingsCopper Interconnects and ReliabilitySemiconductor materials and interfaces