Enhancement of photosensitivity and stability of Sn-12 EUV resist by integrating photoactive nitrate anion
Yeo Kyung Kang, Heeju Kim, Sun Jin Lee, Dongseok Oh, Yang-Hun Yoon, C.M. Kim, Geun Young Yeom, Chan-Cuk Hwang, Myung‐Gil Kim
Topics & Concepts
Extreme ultraviolet lithographyPhotosensitivityPhotolithographyPhotoresistMaterials scienceResistEtching (microfabrication)LithographyOptoelectronicsAmorphous solidNanotechnologyUltravioletChemistryLayer (electronics)Organic chemistryAdvancements in Photolithography TechniquesAdvanced Surface Polishing TechniquesIntegrated Circuits and Semiconductor Failure Analysis